Episode 113 of the Professor Alex Volinsky podcast. Every deposited SiC film carries residual stress, and Stoney's 1909 equation reads it as one number for the whole wafer — but real deposition is non-uniform, and the stress concentrations that crack films hide near the wafer edge. Nonparametric estimation lets the data decide the stress field's shape. Based on the paper: Nonparametric Estimation of SiC Film Residual Stress from the Wafer Surface Profile; O. Savchuk, A.A. Volinsky; Measurement, 2021, Vol. 177, 109238. Hosts Elena and Marcus. AI-generated voices.
